MEMS Design and Fabrication
IC2 offers custom sensor, transducer, and full instrumentation system design and optimization for precision measurements in all kinds of environments. We can design sensors using a wide array of transduction methods and materials to best suit your application.
IC2 uses a three-stage approach to sensor design:
- Lumped-element modeling to capture the key physics
- Formal optimization to maximize performance within design/fabrication constraints, and
- FEM/FEA for model verification
By using lumped-element modeling early in the process and saving FEM for verification we can rapidly converge on an optimal solution to meet targeted specifications. That translates into faster design turnaround time, reduced design costs, and the ability to tune or tweak the designs based on your feedback, or even to rerun a design using completely different parameters should your requirements change.
We believe that a one-size fits all approach is a poor way to achieving a sensing or measurement goal. That is why we use a wide range of transduction methods, choosing the best method for each application. Whether your design calls for capacitive, piezoelectric, piezoresistive, optical, or magnetic sensing, we have the expertise to make it happen.
Modeling and Simulation
IC2 uses a three-stage approach to MEMS device design: lumped-element modeling to capture the key physics, formal optimization to maximize performance within design/fabrication constraints, and multi-physics FEM/FEA for model verification. Using lumped-element modeling early in the process and saving FEM for verification enables rapid convergence on an optimal solution to meet targeted specifications.
Process Flow Design
IC2 begins all process flow development with a high-level overview, selecting a general approach and outlining the major fabrication steps and processes. Then we dive further into each process step, defining all steps and sub-steps in great detail. At this stage, we also nail down specific recipes and process parameters for particular fabrication equipment. Finally, we produce a formal process traveler that will accompany the wafers through the fabrication process, providing sufficient detail to direct a MEMS process engineer or fabrication technician through the full processing of your MEMS devices.
Photolithography Mask Layout
In order to fabricate MEMS devices, you will first need a set of photolithography masks, one for each layer to be patterned. Our comprehensive layout service will provide you with finalized layout files and physical masks in either soda-lime or quartz. We regularly work with major photolithography mask manufacturers and are intimately familiar with all the intricacies of the design and ordering process, ensuring that you get the desired end product.
Microfabrication
IC2 has access to, and experience with, a wide range of microfabrication tools and services for 4″ (100mm) and 6″ (150mm) diameter wafers through its network of academic clean room facilities and commercial fabrication service providers. Our in-house MEMS process engineers are available to perform single processes up to full MEMS device fabrication with either IC2-designed or customer-provided photolithography masks.
Prototype and Limited-Run Production
IC2 is capable of providing R&D prototype and limited-run production services from single-wafer runs to larger multi-wafer lots. For high-volume production, we can help guide you in evaluating and selecting a commercial MEMS foundry that will meet your needs.
